Fab Facility

A state-of-the-art 6 inch Wafer Fabrication CLASS 10 Clean Room facility designed by M/s Anderson DeBartolo, USA and certified by M/s Crowthorne Hi-Tec Services Ltd of UK, capable of processing Wafers in 0.8 micron technology,  complete with UHP water and Nitrogen plants has been established.   The Fab is upgradable to   0.6 micron technological capability and 100,000 wafers per annum processing capacity.

SCL's VLSI Wafer Fab Facility

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